技术研究领域
我们致力于开发成为未来产业发展的技术。
供应着具有差别化技术力的各种产品和方案,
最大限度的贡献于顾客的稳定成长和发展。
半导体
半导体产业是工程细微化成为主要争议的产业,Soulbrain开发着向工程细微化提供最佳方案的各种产品。
Etchant / Cleaning / Stripper etc.
- High Selective Nitride etchant(SiN/O Selectivity) for 3D gate
- High Selectivity Oxide Etchant, HF/BOE, Cleaning Agent & Stripper 개발
CMP Slurries : Ceria slurry, Silica slurry, etc.
- High Planarity Slurry(ILD/IMD, CST-S22), STI(DRAM & Flash), Wet Nano Ceria(DRAM&NAND)
- Cu Barrier Slurry(Alkali, Acidic), W Slurry(2nd step & buffing step)
- Polishing slurry for Packaging(TSV), Nitride/Poly-Si CMP slurry
开发LED及其他工程用Slurry : Bare Silicon Slurry
CVD/ALD Materials
- High-k Precursor : ZAC (Zr), ZEBRA (Zr), Z03 (Zr), HAC (Hf), H03 (Hf)
- Dielectric precursor : HCDS (Si), SBBP01 (Bi)
- Metal precursor : TiCl4 (Ti), TBTDET (Ta), Mo precursor
- New memory precursor : Ge07~12 (Ge), Te01 (Te), Sb01 (Sb), SBIP01~04 (In), SBGP01~03 (Ga)
- Advanced deposition materials
· growth inhibitor (ASP, NSP)
· growth activator (TSI07, SB305)
· Area selective deposition materials
· Atomic layer etching materials
显示器
集中开发可大幅节俭费用的特殊化学材料及用于开发下一代显示器领域的各种新产品。
Etchant for OLED & TFT LCD
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Cu Etchant (for H2O2 & non-H2O2)
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BOE (Si Etch or Cleaning)
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Pixel Etchant (ITO, IZO, IGZO)
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기타 metal Etchant (Al, Mo, Ag, etc.)
Thin Glass
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Glass Etching Chemical & Glass Slimming Process
2次电池
持续性的研究开发2次电池素材和下一代大容量HEV及EV用电解液领域。
Electrolyte for IT, xEV, ESS
- HP(High purity) Grade Solvents : Over 99.9%
- HP Grade Additives : Over 99.0%, Additives are available for customer's demand
- Solutes : Guaranteed solutes for electrolyte
- Cylinder type : 1L bottle, 18L/200L cylinder
Research Area_ Cathode & Anode materials
Electrolyte development
- High Ni Cathode : Gas suppression, Low resistance
- High Si Anode : Long cycle life
- NMX, LMR, Mid-Ni : High Voltage
- LFP : Low temperature, High power
Next generation development
- Sodium-ion battery : Long cycle life, Gas suppression
- Solid-state electrolyte : high ionic conductivity
功能性材料
应对快速变化的市场需求,持续开发具有各种功能性的有机素材。